AIRF organises a workshop on "Field Emission Scanning Electron Microscopy Based Lithography"

Event From Date: 
Wednesday, 16 January 2019
Event End Date: 
Wednesday, 16 January 2019
Event Title: 
AIRF organises a workshop on "Field Emission Scanning Electron Microscopy Based Lithography"
Event Details: 

Advanced Instrumentation Research Facility

 

E mail: directorairf@mail.jnu.ac.in

Date: 07.01.2019

Workshop

on “Field Emission Scanning Electron Microscopy Based Lithography”

to be held on 16th January, 2019

organized jointly by AIRF & TESCAN Orsay Holding, A. S.

 

NOTICE

In order to provide the highest level of services to scientific community a series of workshop / training program on different sophisticated instruments in biological / chemical/ physical sciences are organized by AIRF throughout the year.

In this series, the next workshop will be o

n “Field Emission Scanning Electron Microscopy, Based Lithography” to be held on 16th January, 2019. The workshop shall have lectures and practical sessions by application specialists. Emphasis will be given on FIB and  e-beam lithography.

Applications are invited from registered research students / scholars from an Academic Institution. Class size shall be limited to 20 participants. The workshop is open to all research students and scholars. Depending upon availability not more than one research student / scholar from each lab will be allowed. Decision of the screening committee shall be final and only selected candidates will be allowed to participate the workshop. Application forms are available here.

PRE – REGISTRATION

The training is free and open to all registered research Students and Scholars. Application has to be sent to Director’s Office on or before 14th January, 2019. The selected/shortlisted candidate’s will be informed by email. No TA / DA will be paid.